Refereed articles, selected conference proceedings reports and patents
At LBNL
2024
Temperature-dependent water oxidation kinetics: implications and insights, Tianying Liu, Pan Wang, Wei Li, David Wang, Damith Lekamlage, Boqiang Chen, Frances Houle, Matthias Waegele and Dunwei Wang, submitted for publication. ChemRxiv DOI:10.26434/chemrxiv-2024-j5q6g
Influence of Hole Transport and Thermal Reactions in Photo-driven Water Oxidation Kinetics on Crystalline TiO2, Pan Wang, Gabriel Benitez and Frances Houle, submitted for publication. ChemRxiv DOI: 10.26434/chemrxiv-2024-1xlvq
The US physics community is not done working on trust, Frances Houle, Kate Kirby, Laura Greene and Michael Marder, MIT Technology Review, July 31, 2024.
The Role of Spin-Orbit Coupling on the Spectroscopic Signatures and Intersystem Crossing Rates of Ruthenium Polypyridyl Complexes, Justin J. Talbot, Thomas P. Cheshire, Stephen J. Cotton, Frances A. Houle, and Martin Head-Gordon, DOI: arXiv:2406.12234 [physics.chem-ph], J. Phys. Chem. A., accepted for publication (2024).
The ethics perspective of physics department chairs, Michael Marder, Frances A. Houle and Kate Kirby, Physics Today, March 2024.
2023
A stochastic description of pH within nanoscopic water pools, Sirui Li, Soonho Kwon, William A. Goddard and Frances A. Houle, Cell Reports Physical Science 4, 101458 (2023), DOI: 10.1016/j/xcrp.2023.101458.
Towards a Diverse Next-Generation Energy Workforce: Teaching Artificial Photosynthesis and Electrochemistry in Elementary Schools through Active Learning. B. Soobrian, A. J. King, J. C. Bui, A. Z. Weber, A. T. Bell and F. A. Houle, J. Chem. Educ. 2023, DOI:10.1021/acs.jchemed.3c00085
Hurry Up and Wait: Managing the Inherent Mismatches in Timescales in Natural and Artificial Photosynthetic Systems, Frances A. Houle, Junko Yano and Joel W. Ager, ACS Catalysis, 13, 7139-7158 (2023). https://doi.org/10.1021/acscatal.3c00355 [Data set]. Zenodo. https://doi.org/10.5281/zenodo.7555776
Correction to “Ruthenium Dye Excitations and Relaxations in Natural Sunlight” Thomas P. Cheshire and Frances A. Houle, Journal of Physical Chemistry A, 127, 2212-2213 (2023), http://DOI: 10.1021/acs.jpca.3c00732
Ethics in Physics: the Need for Culture Change, Frances A. Houle, Kate Kirby and Michael Marder, Physics Today 76, 28-35 (2023), http://DOI: 10.1063/PT.3.5156
Water oxidation by a dye-catalyst diad in natural sunlight: timing and coordination of excitations and reactions across timescales of picoseconds to hours. R. Massad, T. P. Cheshire, C. Fan and F. A. Houle, Chemical Science, 14, 1997-2008 (2023), http://DOI: 10.1039/D2SC06966K. ChemRxiv 2022 DOI: 10.26434/chemrxiv-2022-65sks.
2022
Understanding pH within a Nanoscopic Water Pool, Sirui Li, Soonho Kwon, William A. Goddard and Frances A. Houle, ChemRxiv DOI:10.26434/chemrxiv-2022-bjdlh
A Quantitative Model of Charge Injection by Ruthenium Chromophores Connecting Femtosecond to Continuous Irradiance Conditions, Thomas P. Cheshire, Jeb Boodry, Erin A. Kober, M. Kyle Brennaman, Paul G. Giokas, David F. Zigler, Andrew M. Moran, John M. Papanikolas, Gerald J. Meyer, Thomas J. Meyer, and Frances A. Houle*, Journal of Chemical Physics 157, 244703 (2022), http://DOI: 10.1063/PT.3.5156, arXiv DOI:10.48550/arXiv.2209.12042
The 2022 Solar Fuels Roadmap
Gideon Segev*, Jakob Kibsgaard, Christopher Hahn, Zhichuan J. Xu, Wen-Hui Cheng, Todd G. Deutsch, Chengxiang Xiang, Jenny Z. Zhang, Leif Hammarstrom, Daniel G. Nocera, Adam Z. Weber, Peter Agbo, Takashi Hisatomi, Frank E. Osterloh, Kazunari Domen, Fatwa F. Abdi, Sophia Haussener, Daniel J. Miller, Shane Ardo, Paul C. McIntyre, Thomas Hannappel, Shu Hu, Harry Atwater, John M. Gregoire, Mehmed Z. Ertem, Ian D. Sharp, Kyoung-Shin Choi, Jae Sung Lee, Osamu Ishitani, Joel W. Ager, Rajiv Ramanujam Prabhakar, Alexis T. Bell, Shannon Boettcher, Kylie Vincent, Kazuhiro Takanabe, Vincent Artero, Ryan Napier, Beatriz Roldan Cuenya, Marc T. M. Koper, Roel Van De Krol*, Frances Houle* J. Phys D: Applied Physics 2022, DOI: 10.1088/1361-6463/ac6f97
How the Hydrophobic Interface between a Perfluorosulfonic Acid Polymer and Water Vapor Controls Membrane Hydration, Marielle E. Soniat and Frances A. Houle, ACS Applied Polymer Materials 4, 3247-3258 (2022) DOI: 10.1021/acsapm.1c01805
A Guide to Effective Practices for Physics Programs (EP3), Ethics section, Frances A. Houle, Kate Kirby, Michael Marder, John Thomsen. S. McKagan, D.A. Craig, M. Jackson, and T. Hodapp, Eds., (American Physical Society, College Park, MD, Version 2021.1), 2022 (website link)
2021
(Photo)electrocatalysis For Renewable Energy, Abishek Dey, Frances A. Houle, Carolyn E. Lubner, Marta Sevilla and Wendy J. Shaw, ChemComm, DOI: 10.1039/D0CC90530E
Toward Predictive Permeabilities: Experimental Measurements and Multiscale Simulation of Methanol Transport in Nafion, Marielle Soniat, Sarah M. Dischinger, Lien-Chun Weng, Hajhayra Martinez Beltran, Adam Z. Weber, Daniel J. Miller, Frances A. Houle, J. Polymer Science, 59, 594-613 (2021), DOI: http://10.1002/pol.20200771 (cover article)
Adaptive Response by an Electrolyte: Resilience to Electron Losses in a Dye-Sensitized Porous Photoanode, Frances A. Houle, Chemical Science, 12, 6117 – 6128 (2021), DOI: http://10.1039/d1sc00384d
An On-demand, Drop-on-Drop Method for Studying Enzyme Catalysis by Serial Crystallography, Agata Butryn, Philipp S. Simon, Pierre Aller, Philip Hinchliffe, Ramzi N. Massad, Gabriel Leen, Catherine L. Tooke, Isabel Bogacz, In-Sik Kim, Asmit Bhowmick, Aaron S. Brewster, Nicholas E. Devenish, Jürgen Brem, Jos J. A. G. Kamps, Pauline A. Lang, Patrick Rabe, Danny 6 Axford, John H. Beale, Bradley Davy, Ali Ebrahim, Julien Orlans Selina L. S. Storm, Tiankun Zhou, Shigeki Owada, Rie Tanaka, Kensuke Tono, Gwyndaf Evans, Robin L. Owen, Frances A. Houle, Nicholas K. Sauter, Christopher J. Schofield, James Spencer, Vittal K. Yachandra, Junko Yano, Jan F. Kern, Allen M. Orville, Nature Communications 12, 4461 (2021), DOI: 10.1038/s41467-021-24757
Ruthenium Dye Excitations and Relaxations in Natural Sunlight, Thomas P. Cheshire and Frances A. Houle, Journal of Physical Chemistry A, 125, 4365-4372 (2021), DOI: 10.1021/acs.jpca.1c02386.
2020
Practical Challenges in the Development of Photoelectrochemical Solar Fuels Production, Mark Spitler, Miguel Modestino, Todd Deutsch, Chengxiang Xiang, James Durrant, Daniel Esposito, Sophia Haussener, Stephen Maldonado, Ian D. Sharp, Bruce Parkinson, David Ginley, Frances Houle, Thomas Hannappel, Nathan Neale, Daniel Nocera and Paul McIntyre, Sustainable Energy & Fuels, https://doi.org/10.1039/C9SE00869A, (2020)
Permeation of CO2 and N2 Through Glassy Poly(Dimethyl Phenylene) Oxide (PPO) under Steady and Pre-Steady State Conditions, Marielle Soniat, Meron Tesfaye, Daniel J. Brooks, Nicholas D. Humphrey, Amirhossein Mafi, Lien-Chun Weng, Boris Merinov, William A. Goddard, III, Adam Z. Weber, and Frances A. Houle, Journal of Polymer Science, 58, 1207-1228 (2020) DOI: 10.1002/pol.20200053 (cover article)
Ultrafast Relaxations in Ruthenium Polypyridyl Chromophores Determined by Stochastic Kinetics Simulations, Thomas P. Cheshire, M. Kyle Brennaman, Paul G. Giokas, David F. Zigler, Andrew M. Moran, John M. Papanikolas, Gerald J. Meyer, Thomas J. Meyer, and Frances A. Houle, Journal of Physical Chemistry B, 124, 5971-5985 (2020), DOI: 10.1021/acs.jpcb.0c03110
Emergent Degradation Phenomena Demonstrated on Resilient, Flexible and Scalable Integrated Photoelectrochemical Cells, Tobias A. Kistler, Guosong Zeng, James L. Young, Lien-Chun Weng, Chase Aldridge, Keenan Wyatt, Myles A. Steiner, Oscar Solorzano Jr., Frances A. Houle, Francesca M. Toma, Adam Z. Weber, Todd G. Deutsch, Nemanja Danilovic, Advanced Energy Materials, 2002706, 2020, DOI: 10.1002/aenm.202002706
A Purely Kinetic Description of the Evaporation of Water Droplets, F. A. Houle, R. E. H. Miles, C. J. Pollak and J. P. Reid, J. Chem. Phys. 154, 054501 (2021); https://doi.org/10.1063/5.0037967 (invited)
2019
Membranes for Solar Fuels Devices (Invited book chapter), Daniel J. Miller and Frances A. Houle, Integrated Solar Fuel Generators, I. D. Sharp, J. Lewerenz, and H. Atwater, Editors, Royal Society of Chemistry, Cambridge (2019), ISBN 978-1-78262-555–1
Reaction-Transport Coupling in a Nanostructured Porous Electrode, Frances A. Houle, Journal of Physical Chemistry C, 123, 14459−14467 (2019), DOI: 10.1021/acs.jpcc.9b02261
Probing the Formation of Chemical Gradients in Heterogeneously Oxidized, Diffusion-Limited Aerosol Particles Using Photoemission, Michael I. Jacobs, Bo Xu, Oleg Kostko, Aaron A. Wiegel, Frances A. Houle, Musahid Ahmed, and Kevin R. Wilson, Journal of Physical Chemistry A, 123, 6034-6044 (2019), DOI: 10.1021/acs.jpca.9b04507
2018
Predictive simulation of non-steady-state transport of gases through rubbery polymer membranes, Marielle Soniat, Meron Tesfaye, Daniel Brooks, Boris Merinov, William A. Goddard, III, Adam Weber and Frances A. Houle, Polymer, 134, 125-142 (2018), DOI: 10.1016/j.polymer.2017.11.055
The energy challenge of separating hydrocarbon products from (photo)electrochemical reduction of carbon dioxide and water, Jeffery B. Greenblatt, Daniel J. Miller, Joel W. Ager, Frances A. Houle, Ian D. Sharp, Joule 2, 381-420 (2018), DOI: 10.1016/j.joule.2018.01.014
Changes in reactivity as chemistry becomes confined to an interface. The case of free radical oxidation of C30H52 alkane by OH, Frances A. Houle, Aaron A. Wiegel, Kevin R. Wilson, Journal of Physical Chemistry Letters 9, 1053-1057 (2018), DOI: 10.1021/acs.jpclett.8b00172
A Multiphase Mechanism for the Production of Sulfuric Acid from SO2 by Criegee Intermediates Formed During the Heterogeneous Reaction of Ozone with Squalene, Nadja Heine, Caleb Arata, Allen H. Goldstein, Frances A. Houle, Kevin R. Wilson, Journal of Physical Chemistry Letters, 9, 3504-3510 (2018), DOI: 10.1021/acs.jpclett.8b01171
Pathways to Solar Hydrogen Technologies, Shane Ardo, David Fernandez Rivas, Miguel Modestino, Verena Schulze Greiving, Fatwa F. Abdi, Esther Alarcon llado, Vincent Artero, Katherine Ayers, Corsin Battaglia, Jan-Philipp Becker, Dmytro Bederak, Alan Berger, Francesco Buda, Enrico Chinello, Valerio Di Palma, Tomas Edvinsson, Katsushi Fujii, Han Gardeniers, Hans Geerlings, S. Mohammad H. Hashemi, Sophia Haussener, Frances Houle, Jurriaan Huskens, Brian D. James, Kornelia Konrad, Akihiko Kudo, Pramod Patil Kunturu, Detlef Lohse, Bastian Mei, Eric L. Miller, Gary F. Moore, Jiri Muller, Katherine L. Orchard, Timothy E. Rosser, Fadl Saadi, Jan-Willem Schüttauf, Brian Seger, Stafford W. Sheehan, Wilson A. Smith, Joshua Spurgeon, Maureen Tang, Roel van de Krol, Peter Vesborg, and Pieter Westerik, Energy & Environmental Science, 2018, DOI: 10.1039/c7ee03639f
Swelling and diffusion during methanol sorption into hydrated Nafion, Marielle Soniat and Frances A. Houle, Journal of Physical Chemistry B 122, 8255−8268 (2018) DOI: 10.1021/acs.jpcb.8b03169
Predicting aerosol reactivity across scales: from the laboratory to the atmosphere, Frances A. Houle, Aaron A. Wiegel and Kevin R. Wilson, Environmental Science and Technology (2018) DOI: 10.1021/acs.est.8b04688
2017
Hybrid composite coatings for durable and efficient solar hydrogen generation under diverse operating conditions, Karl A. Walczak, Gideon Segev, David M. Larson, Jeffrey W. Beeman, Frances A. Houle, Ian D. Sharp, Advanced Energy Materials, 2017, DOI 10.1002/aenm.201602791
Diffusive confinement of free radical intermediates in the OH radical oxidation of semisolid aerosol, Aaron A. Wiegel, Matthew J. Liu, William D. Hinsberg, Kevin R. Wilson and Frances A. Houle, Physical Chemistry Chemical Physics 2017, DOI: 10.1039/C7CP00696A
Invited Aerosol fragmentation driven by coupling of acid-base and free radical chemistry in the heterogeneous oxidation of aqueous citric acid by OH radicals, M. L. Liu, A. A. Wiegel, K. R. Wilson and F. A. Houle, Journal of Physical Chemistry A, 2017, 121 (31), pp 5856–5870. DOI: 10.1021/acs.jpca.7b04892
Exploring chemistry in micro-compartments using guided droplet collisions in a branched quadrupole trap coupled to a single droplet, paper spray mass spectrometer, Michael I. Jacobs, James F. Davies, Lance Lee, Ryan D. Davis, Frances Houle, Kevin R. Wilson, Anal. Chem., 2017, 89 (22), pp 12511–12519, DOI: 10.1021/acs.analchem.7b03704
Colliding-Droplet Microreactor: Rapid On-Demand Inertial Mixing and Metal-Catalyzed Aqueous Phase Oxidation Processes, Ryan D. Davis, Michael I. Jacobs, Frances A. Houle and Kevin R. Wilson, Anal. Chem., 2017, 89 (22), pp 12494–12501, DOI: 10.1021/acs.analchem.7b03601
Connecting the Elementary Reaction Pathways of Criegee Intermediates to the Chemical Erosion of Squalene Interfaces Produced by Ozonolysis, Nadja Heine, Frances A. Houle, Kevin R. Wilson, Environmental Science and Technology, 2017, DOI: 10.1021/acs.est.7b04197
2016
Opportunities to improve the net energy performance of photoelectrochemical water-splitting technology, Roger Sathre, Jeffery Greenblatt, Karl Walczak, Ian Sharp, John Stevens, Joel Ager, Frances Houle, Energy & Environmental Science, 9, 803 – 819 (2016).
Mechanistic insights into chemical and photochemical transformations of Bismuth Vanadate photoanodes, Francesca M. Toma, Jason Cooper, Viktoria Kunzelmann, Matthew McDowell, Jie Yu, David Larson, Nicholas Borys, Christine Abelyan, Jeffrey Beeman, Kin Man Yu, Jinhui Yang, Le Chen, Matthew Shaner, Joshua Spurgeon, Frances Houle, Kristin Persson, Ian Sharp, Nature Communications, 7, 12012, DOI: 10.1038/ncomms12012 (2016).
2015
Stochastic methods for aerosol chemistry: a compact molecular description of functionalization and fragmentation in the heterogeneous oxidation of squalane aerosol by OH radicals, A. Wiegel,K. R. Wilson,W. D. Hinsberg,and F. A. Houle, Physical Chemistry Chemical Physics, 17, 4398-4411 (2015).
Oxidation of a model alkane aerosol by OH radical: the emergent nature of reactive uptake, F. A. Houle, W. D. Hinsberg, and K. R. Wilson, Physical Chemistry Chemical Physics, 17, 4412-4423 (2015).
Particle Suspension Reactors and Materials for Solar-Driven Water Splitting, David M. Fabian, Shu Hu, Nirala Singh, Frances A. Houle, Takashi Hisatomi, Kazunari Domen, Frank Osterloh, and Shane Ardo, Energy & Environmental Science, 8, 2825-2850 (2015)
2014
Life-cycle net energy assessment of large-scale hydrogen production via photo-electrochemical water-splitting, Roger Sathre, Corinne D. Scown, William R. Morrow III, John C. Stevens, Ian D. Sharp, Joel W. Ager, Karl Walczak, Frances A. Houle and Jeffery B. Greenblatt, Energy Environ. Sci. 7, 3264-3278 (2014)
While at InVisage Technologies
2011
Energy Critical Elements: Securing Materials for Emerging Technologies, APS Panel on Public Affairs and the Materials Research Society, American Physical Society, 2011.
At IBM
2009
Quantification of outgassing of C, Si and S-containing products during exposure of photoresists, F. A. Houle, N. Maxim, J. Huijbregtse, V. R. Deline, H. Truong and W. van Schaik, J Vac Sci Technol B27, 654 (2009).
Introduction of Role Playing to a Research Ethics Module for the Undergraduate, D. C. Miller, F. A. Houle, J. Stemwedel, J. Pesek and C. Wade, Mater. Res. Soc. Proc. 1233, 1233-PP09-06 (2009).
Characterization of vinyl ether UV-cure nanoimprint resist, T. Furukawa, F. A. Houle, D. L. Casher and D. C. Miller, Proc. SPIE 7271, 727129 (2009).
Quantitative measurement of resist outgassing during exposure, N. Maxim, F. A. Houle, J. Huijbregtse, V. R. Deline, H. Truong and W. van Schaik, Proc. SPIE 7273, 72733Z (2009).
Cr migration on 193nm binary photomasks, Bruley, G. Burr, R. E. Davis, P. Flaitz, W. D. Hinsberg, F. A. Houle, D. C. Miller, M. Pike, J. Rankin, A. Wagner, A. Watts, Proc. SPIE 7272, 727215 (2009).
2008
Invited Nanoimprint Materials Systems, F. A. Houle, D. C. Miller, A. Fornof, H. Truong, S. Raoux, R. Sooriyakumaran, H. Ito and M. Hart, Photopolymer Sci Technol 21, 563-572 (2008)
Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials, F. A. Houle, S. Raoux, D. C. Miller, C. Jahnes and S. Rossnagel, J Vac Sci Technol B26, 1301-1304 (2008).
Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions, Frances A. Houle, Ann Fornof, Dolores C. Miller, Simone Raoux, Hoa Truong, Eva Simonyi, Christopher Jahnes, Stephen Rossnagel, Proc. SPIE, 6921, 69210B (2008).
Evaluation of 32nm Advanced Immersion Lithography Pellicles, Zhou, K. Racette, M. Hibbs, T. Mizoguchi, D. Hasselbeck, M. Barrett, R. Nolan, F. Houle, J. Ritter, A. Wagner, M. Caterer, Proc SPIE, 7122, 71220B (2008).
2007
Adhesion between template materials and UV-cured nanoimprint resists, F. A. Houle, Eric Guyer, D. C. Miller and Reinhold Dauskardt, J. Vac. Sci. Technol. B 23, 2427 (2007).
Anti-adhesion considerations for UV nanoimprint lithography, F. A. Houle, C. T. Rettner, D. C. Miller and R. Sooriyakumaran, Appl. Phys. Lett. 90, 213103 (2007).
Characterization of volatile species formed during exposure of photoresists to ultraviolet light, F. A. Houle, V. R. Deline, H. Truong and R. Sooriyakumaran, Macromolecules 40, 7505-7512 (2007).
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography, Frances A. Houle, Ann Fornof, Ratnam Sooriyakumaran, Hoa Truong, Dolores C. Miller, Martha I. Sanchez, Blake Davis, Teddie Magbitang, Robert D. Allen, Mark W. Hart and Geraud Dubois, Proc. SPIE 6519, 65191C (2007).
2006
Invited Real-world kinetics via simulations, F. A. Houle and W. D. Hinsberg, Annual Reports in Computational Chemistry 2, 3 (2006).
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography, William Hinsberg and Frances A. Houle, Journal of Photopolymer Science and Technology 19, 623 (2006).
Direct determination of photoresist composition changes during UV exposure, Frances A. Houle, Vaughn R. Deline, Hoa Truong, and Ratnam Sooriyakumaran, Proc. SPIE 6153, 61530Z (2006)
Adhesion between template materials and UV-cured nanoimprint resists, Frances A. Houle, Eric Guyer, Dolores C. Miller, Reinhold Dauskardt, Emily Rice, and Jeremy Hamilton, Proc. SPIE 6153, 61531B (2006).
Vinyl ether resist system for UV-cured nanoimprint lithography, Hiroshi Ito, Frances A. Houle, Mark W. Hart, and Rick A. DiPietro, Proc. SPIE 6153, 61531A (2006).
2005
Characterization of polymer reactive dissolution and swelling using a quartz crystal microbalance and reflectance interferometry, W. D. Hinsberg, F. Houle, S-W. Lee, H. Ito and K. Kanazawa, Macromolecules 38, 1882-1989 (2005).
Numeric analysis of the role of liquid phase UV photochemistry in 193nm immersion lithography, W. D. Hinsberg and F. A. Houle, J. Vac. Sci. Technol. B 23, 2427-2435 (2005).
Evaluation of Functional Properties of Imaging Materials for Water Immersion Lithography, W. D. Hinsberg, J. A. Hoffnagle, G. M. Wallraff, C. E. Larson, F. A. Houle, L. Sundberg, H. D. Truong, B. W. Davis and R. D. Allen, Advances in Resist Technology and Processing XXII SPIE 5753, 508-518 (2005)
Studies of acid diffusion in low Ea Chemically Amplified Photoresists, Gregory M. Wallraff, Carl E. Larson, David Medeiros, Martha I. Sanchez, Karen E. Petrillo, Charles T. Rettner, William D. Hinsberg, Frances A. Houle and John A. Hoffnagle, Advances in Resist Technology and Processing XXII .SPIE 5753, 309-318 (2005).
2004
Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging, F. A. Houle, W. D. Hinsberg and M. I. Sanchez, J. Vac. Sci. Technol.B 22, 747-757 (2004).
Ethics and the Welfare of the Physics Profession, K. Kirby and F. A. Houle, Physics Today, November, 2004, pages 42-46.
Sub-50nm half-pitch imaging with a low activation energy chemically amplified photoresist, G. M. Wallraff, D. R. Medeiros, M. Sanchez, K. Petrillo, W.-S. Huang, C. Rettner, B. Davis, C. E. Larson, L. Sundberg, P. J. Brock, W. D. Hinsberg, F. A. Houle, J. A. Hoffnagle, D. Goldfarb, K. Temple, S. Wind and J. Bucchingnano, J. Vac. Sci. Technol. B 22, 3479-3484 (2004).
Evaluation of resist-liquid interactions for 193-nm liquid immersion lithography, W. D. Hinsberg, G. Wallraff, C. Larson, B. Davis, V. Deline, S. Raoux, D. Miller, F. Houle, H. John, L. Sundberg, R. Dammel, W. Conley, Advances in Resist Technology and Processing XXI, SPIE Vol 5376 (2004).
Reactive dissolution kinetics of lithographic copolymers, W. D. Hinsberg, F. Houle and H. Ito, Advances in Resist Technology and Processing XXI, SPIE Vol 5376 (2004).
Fast calculation of images for high numerical aperture lithography, E. Rosenbluth, G. Gallatin, R. L. Gordon, W. Hinsberg, J. Hoffnagle, F. Houle, A. Lvov, M. Sanchez, M. Seong, Optical Microlithography XVII, SPIE Vol 5377 (2004).
2003
Use of interferometric lithography to characterize the spatial resolution of a photoresist film, F. A. Hoffnagle, W. D. Hinsberg, F. A. Houle and M. I. Sanchez, Photopolymer Sci. Technol. 16, 373 (2003).
Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography, G. M. Gallatin, F. A. Houle, and J. L. Cobb, J. Vac. Sci. Technol.B 21, 3172-3176 (2003).
Estimated impact of shot noise in extreme ultraviolet lithography, J. L. Cobb, F. A. Houle and G. M. Gallatin, Emerging Lithographic Technologies VII, Proc. SPIE 5037, 397 (2003).
Characterization of photoresist spatial resolution by interferometric lithography, J. A. Hoffnagle, W. D. Hinsberg, F. A. Houle, M. I. Sanchez, Metrology, Inspection and Process Control for Microlithography XVII, SPIE 5038 (2003).
Invited Extendability of chemically amplified resists: another brick wall? W. D. Hinsberg, F. A. Houle, M. I. Sanchez, J. A. Hoffnagle, G. M. Wallraff, D. R. Medeiros, J. L. Cobb, Advances in Resist Technology and Processing XX, SPIE Vol 5039, 1 (2003).
Using the critical ionization model for resist development to estimate contrast curves and roughening, F. A. Houle, W. D. Hinsberg and M. I. Sanchez, Advances in Resist Technology and Processing XX, SPIE Vol 5039, 334 (2003).
Kinetics of reactive dissolution of lithographic polymers, W. D. Hinsberg, F. A. Houle, S. Lee, K. Kanazawa, H. Ito, and L. Sundberg, Proceedings of the 13th International Conference on Photopolymers, Society of Plastics Engineers (2003).
2002
The influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist, F. A. Houle, W. D. Hinsberg, M. I. Sanchez and J. A. Hoffnagle, J. Vac. Sci. Technol. B 20, 924-931 (2002).
Invited Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists, W. D. Hinsberg, F. A. Houle, G. M. Poliskie, D. Pearson, M. I. Sanchez, and H. Ito, J. Phys. Chem. A 106, 9776-9787 (2002).
High NA lithography imagery at Brewster’s angle, T. A. Brunner, J.A. Hoffnagle, W. D. Hinsberg, F. A. Houle, M. I. Sanchez, Microlith. Microfab. Microsys. 1, 188 (2002).
A method to measure the spatial resolution of a photoresist, J. A. Hoffnagle, W. D. Hinsberg, M. I. Sanchez and F. A. Houle, Optics Lett. 27, 1776-1778 (2002).
Kinetic model of positive-tone resist dissolution and roughening, F. A. Houle, W. D. Hinsberg and M. I. Sanchez, Macromolecules 35 3591-3600 (2002).
EUV photoresist performance results from the VNL and the EUV LLC, J. L. Cobb, P. M. Dentinger, A. Fisher, J. E. Goldsmith, L. L . Hunter, D. J. O’Connell, G. M. Gallatin, W. D. Hinsberg, F. A. Houle, M. I. Sanchez, W. Domke, S. Wurm, U. Okoroanyanwu, S. Lee, E. M. Panning, Emerging Lithographic Technologies VI, SPIE Proceedings 4688 (2002).
High numerical aperture: imaging implications for chemically amplified photoresists, M. I. Sanchez, F. A. Houle, J.A. Hoffnagle, T. A. Brunner, W. D. Hinsberg, Adv. Resist technology and processing XIX, Proc. SPIE 4690 (2002).
2001
Invited Chemistry and Physics of the Post-expose Bake Process in Chemically Amplified Resists, W. D. Hinsberg, F. Houle, M. Sanchez and G. Wallraff, IBM Journal of Research and Development, 45, 667 (2001).
Studies of Acid Diffusion in Polymers for 248, 193, and 157 nm Photoresist Applications, G. M. Wallraff, S. Bangsaruntip, W. Hinsberg, F. Houle, M. Sanchez, C. Larson, G. Breyta, Proceedings of the 12th International Conference on Photopolymers, Society of Plastics Engineers, 375 (2001).
2000
Determination of Coupled Acid Catalysis-Diffusion Processes in a Positive Tone Chemically Amplified Photoresist. F. A. Houle, W. D. Hinsberg, M. Morrison, G. Wallraff, C. Larson, M. Sanchez and J. Hoffnagle, J. Vac. Sci. Technol. B 18, 1874-1885 (2000).
Real-time Analysis of Volatiles Formed during Processing of a Chemically Amplified Resist, F. A. Houle, G. M. Poliskie, W. D. Hinsberg, D. Pearson, M. I. Sanchez, H. Ito, J. A. Hoffnagle, Proc. SPIE, Advances in Resist Technology and Processing XVII, 3999, 181 (2000).
Effect of Resist Components on Image Spreading during Post-Exposure Bake of Chemically Amplified Resists, W. D. Hinsberg, F. A. Houle, M. I. Sanchez, M. E. Morrison, G. M. Wallraff, C. E.Larson, J. A. Hoffnagle, P. J. Brock, G. Breyta, Proc. SPIE, Advances in Resist Technology and Processing XVII, 3999, 148 (2000).
1999
Factors Controlling Pattern Formation in Chemically Amplified Resists at Sub-100 nm Dimensions., W. D. Hinsberg, F. Houle, G. Wallraff, M. Sanchez, M. Morrison, J. Hoffnagle, H. Ito, C. Nguyen, C. Larson, P. Brock and G. Breyta, Photopolym. Sci. Tech., 12, 649-662 (1999).
Liquid Immersion Deep-UV Interferometric Lithography, J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez and F. A. Houle, J. Vac. Sci. Technol. B 17, 3306 (1999).
Experimental Method for Quantifying Acid Diffusion in Chemically Amplified Resists, Wallraff, W. D. Hinsberg, F. A. Houle, M. Morrison, C. Larson, M. Sanchez, J. Hoffnagle, P. J. Brock and G. Breyta, Proc. SPIE, Advances in Resist Technology and Processing XVI, 3678, 138 (1999).
Line-Edge Roughness Comparison of Photoresists using Interferometric Lithography, M. I. Sanchez, W. D. Hinsberg, F. A. Houle, J. Hoffnagle, H. Ito and M. Morrison, Proc. SPIE, Advances in Resist Technology and Processing XVI, 3678, 160 (1999).
1998
Stochastic Simulation of Heat Flow with Application to Laser-Solid Interactions, F. A. Houle and W. D. Hinsberg, Appl. Phys. A 66, 143-151 (1998).
In Situ FTIR Spectroscopy and Stochastic Modelling of Surface Chemistry of Amorphous Silicon Growth, U. Wetterauer, J. Knobloch, P. Hess and F. A. Houle, J. Appl. Phys. 83, 6096-6105 (1998).
Mechanistic Studies of Chemically Amplified Photoresists, W. D. Hinsberg, G. Wallraff, F. A. Houle, M. Morrison, J. Frommer, R. Beyers and J.Hutchinson, Organic Thin Films, ACS Symposium Series, C. Frank, ed., Amer. Chem. Soc., Washington DC, vol 695, 344-359 (1998).
Deep UV Interferometric Lithography as a Tool for Assessment of Chemically Amplified Resist Performance, W. D. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison and S. Frank, J. Vac. Sci. Technol. B 16, 3689-3694 (1998).
1997
Reactivity and Kinetic Parameters of UVII-HS, Wallraff, J. Opitz, W. Hinsberg, F. Houle, J. Thackeray, T. Fedynyshyn, D. Kang and M. Rajaranam, SPIE Advances in Resist Technology and Processing XIV, 3049, 490-500 (1997).
1996
Chemical Kinetics Simulator, code and support materials. Predecessor to Kinetiscope and available from IBM via the web under a no-cost license until 2009. Many 10’s of thousands of copies downloaded worldwide.
1995
Kinetics of Thermal and Acid-Catalyzed Deprotection in Deep UV Resist Materials, J. Hutchinson, G. Wallraff, W. Hinsberg, F. Houle and P. Seidel, Microelectronic Engineering, 27, 397-400 (1995).
Stochastic Simulations of Temperature Programmed Desorption Kinetics, F. A. Houle and W. D. Hinsberg, Surface Science, 338, 329-346 (1995).
Simulations of Thermal Decomposition and Film Growth from the Group VI Metal Hexacarbonyls, F. A. Houle and W. D. Hinsberg, J. Phys. Chem. 99, 14477-14485 (1995).
Kinetics of Chemically Amplified Resists, G. Wallraff, W. Hinsberg, F. Houle, P. Seidel and J. Hutchinson, Photopolymers – Principles, Processes and Materials Regional Technical Conference, Society for Plastics Engineering (1995).
Kinetics of Chemically Amplified Resists, G. Wallraff, W. Hinsberg, F. Houle, J. Opitz, D. Hopper and J. Hutchinson, SPIE Advances in Resist Technology and Processing XII, 2438, 182-190 (1995).
1994
Thermal and Acid-Catalyzed Deprotection Kinetics in Deep UV Resist Materials, G. Wallraff, J. Hutchinson, W. Hinsberg, F. A. Houle, P. Seidel, R. Johnson, and W. Oldham, J. Vac. Sci. Technol. B12, 3857-3862 (1994).
1993
Electron Impact Fragmentation of Gases by Molecular Beam Mass Spectrometry. Application to AsCl3 and a GaCl3/Ga2Cl6 Mixture, F. A. Houle, Int. J. Mass. Spec. Ion Proc. 123, 243-252 (1993).
Laser Assisted Chemical Vapor Deposition from the Metal Hexacarbonyls, K. A. Singmaster and F. A. Houle, Laser Chemistry of Organometallics, J. Chaiken, Ed. ACS Symposium Series 530, Chapter 21 (1993).
1992
Continuous Wave Visible Laser-Assisted Decomposition of Cr(CO)6 on a Growing Film: In Situ Observations, F. A. Houle and L. I. Yeh, J. Phys. Chem. 96, 2691 (1992).
Chemical Changes Accompanying Facet Degradation of AlGaAs Quantum Well Lasers, F. A. Houle, D. L. Neiman, W. C. Tang and H. J. Rosen, J. Appl. Phys. 72, 3884-3896 (1992).
Visible Laser Induced Nucleation and Growth of Cr, Mo and W Films from the Hexacarbonyls. Reactivity of CO on Film Surfaces, F. A. Houle and K. A. Singmaster, J. Phys. Chem. 96, 10425-10439 (1992)
Fundamental Aspects of Laser Deposition of Thin Metal Films: Chemistry of Contamination, K. A. Singmaster and F. A. Houle, “Symposia on Reliability of Semiconductor Devices/Interconnections and Dielectric Breakdown and Laser Processes for Microelectronic Applications”, Electrochemical Society Proceedings 92-4, 265 (1992).
Surface Chemistry of Laser-Assisted Film Growth, F. A. Houle, Proceedings of Laser Advanced Materials Processing, High Temperature Society of Japan, 203 (1992).
1991
Effect of Laser Heating on Compositions of Films Deposited from the Metal Hexacarbonyls, K. A. Singmaster and F. A. Houle, MRS Symp. Proc. 201, 159 (1991).
Doping Effects on the Etching Chemistry of GaAs and Si, F. A. Houle, MRS Symp. Proc. 204, 25 (1991).
1990
Photochemical Deposition of Thin Films from the Metal Hexacarbonyls, K. A. Singmaster, F. A. Houle and R. J. Wilson, J. Phys. Chem. 94, 6864 (1990).
1989
Invited Laser Deposition of Films from Acetylacetonate Complexes, F. A. Houle, T. H. Baum and C. R. Moylan”, Laser Chemical Processing for Microelectronics”, K. Ibbs and R. M. Osgood, Jr., Editors, Cambridge University Press, Cambridge (1989), Chapter 2.
Photochemical Etching of Silicon: the Influence of Photogenerated Charge Carriers, F. A. Houle, Phys. Rev. B39, 10 120 (1989).
Surface Reactions Leading to Contamination of Metal Films Photochemically Deposited from the Hexacarbonyls, K. A. Singmaster, F. A. Houle and R. J. Wilson, MRS Symp. Proc. 131, 469 (1989).
Surface Photoprocesses in Laser Assisted Etching and Film Growth, F. A. Houle, J. Vac. Sci. Technol. B7, 1149 (1989).
1988
Interdependence of Optical Excitation and Surface Chemistry in Laser Induced Deposition and Etching, F. A. Houle, Laser Chemistry 9, 107 (1988) (invited).
Origin of Contaminants in Photochemically Deposited Chromium Films, F. A. Singmaster, F. A. Houle and R. J. Wilson, Appl. Phys. Lett. 53, 1048 (1988).
Photostimulated Desorption in Laser-Assisted Etching of Silicon, F. A. Houle, Phys. Rev. Lett. 61, 1871 (1988).
Desorption Dynamics of SiF4 Etch Product, F. A. Houle, Vac. Sci. Technol. A6, 840 (1988).
Mechanistic Studies of Etching of Silicon by XeF 2, F. A. Houle, Symposium on Dry Process, Electrochemical Society Proceedings 88-7, 17 (1988).
1987
Optical Self-Regulation during Laser-Induced Oxidation of Copper, L. Baufay, F. A. Houle and R. J. Wilson, J. Appl. Phys. 61, 4640 (1987).
Dynamics of Desorption of SiF4 During Etching of Silicon by XeF2, F. A. Houle, J. Chem. Phys. 87, 1866 (1987).
On the Relative Importance of Physical and Chemical Sputtering in Ion-Enhanced Etching of Silicon by XeF2, F. A. Houle, Appl. Phys. Lett. 50, 1838 (1987).
Real-Time Studies of Laser-Oxidation of Copper: Characteristics of an Optical Heat Source, L. Baufay, F. A. Houle and R. J. Wilson, MRS Symp. Proc. 75, 281 (1987).
1986
Surface Processes Leading to Carbon Contamination of Photochemically Deposited Copper Films, F. A. Houle, R. J. Wilson and T. H. Baum, J. Vac. Sci. Technol. A 4, 2452 (1986).
A Reinvestigation of the Etch Products of Silicon and XeF2: Doping and Pressure Effects, F. A. Houle, J. Appl. Phys. 60, 3018 (1986).
Basic Mechanisms in Laser Etching and Deposition, F. A. Houle, Appl. Phys. A 41, 315 (1986) (invited).
Fundamental Aspects of Photon Assisted Processing, F. A. Houle, “Reduced Temperature Processing for VLSI”, Electrochemical Society Symposium Proceedings 86-5, 32 (1986)
1985
Photochemical Generation and Deposition of Copper from the Gas Phase, C. R. Jones, F. A. Houle, C. A. Kovac and T. H. Baum, Appl. Phys. Lett. 46, 97 (1985).
Laser Chemical Vapor Deposition of Copper, F. A. Houle, C. R. Jones, T. H. Baum, C. Pico and C. A. Kovac, Appl. Phys. Lett. 46, 204 (1985).
Composition, Structure and Electric Field Variations in Photodeposition, R. J. Wilson and F. A. Houle, Phys. Rev. Lett. 55, 2184 (1985).
1984
Photoeffects on the Fluorination of Silicon. II. Kinetics of the Initial Response to Light, F. A. Houle, J. Chem. Phys. 80, 4851 (1984).
Photoelectron Spectroscopy of 1-Propyl, 1-Butyl, Isobutyl, Neopentyl and 2-Butyl Radicals: Free Radical Precursors to High Energy Carbonium Ions, J. C. Schultz, F. A. Houle and J. L. Beauchamp, J. Am. Chem. Soc 106, 3917 (1984).
Photoelectron Spectroscopy of Isomeric C4.H7 Radicals. Implications for the Thermochemistry and Structures of the Radicals and their Corresponding Carbonium Ions, J. C. Schultz, F. A. Houle and J. L. Beauchamp, J. Am. Chem. Soc. 106, 7336 (1984).
Mechanism of Laser-Enhanced Etching of Silicon, F. A. Houle, MRS Symp. Proc. 29, 203 (1984).
Laser-Assisted Chemical Etching, F. A. Houle, Proc. SPIE 459, 110 (1984).
1983
Gaseous Products from the Reaction of XeF2 with Silicon, H. F. Winters and F. A. Houle, J. Appl. Phys. 54, 1218 (1983).
Nonthermal Effects in Laser-Enhanced Etching of Silicon by XeF2, F. A. Houle, Chem. Phys. Lett. 95, 5 (1983).
Photoeffects on the Fluorination of Silicon. I. Influence of Doping on Steady-State Phenomena, F. A. Houle, J. Chem. Phys. 79, 4237 (1983).
Rapid Laser-Induced Chemical Etching of Semiconductors, F. A. Houle, Proc. SPIE 385, 127 (1983).
1982
Nonadiabaticity in Ion-Molecule Reactions: Coupling of Proton and Charge Transfer in the H2+ and D2+ + Ar System, F. A. Houle, S. L. Anderson, D. Gerlich, T. Turner and Y. T. Lee, J. Chem. Phys. 77, 748 (1982).
At Caltech and LBNL
1981-1976
Simulation Methods in Kinetics Courses, F. A. Houle and D. L. Bunker, J. Chem. Educ. 58, 405 (1981).
The Effect of Vibrational and Translational Energy on the Reaction Dynamics of the H2+ + H2 System, S.L. Anderson, F. A. Houle, D. Gerlich and Y. T. Lee, J. Chem. Phys. 75, 2153 (1981).
Vibrational Effects in Proton and Charge Transfer in the H2+ + Ar System, F. A. Houle, S. L. Anderson, D. Gerlich, T. Turner and Y. T. Lee, Chem. Phys. Lett. 82, 392 (1981).
Thermal Decomposition Pathways of Alkyl Radicals by Photoelectron Spectroscopy. Application to Cyclopentyl and Cyclohexyl Radicals, F. A. Houle and J. L. Beauchamp, J. Phys. Chem. 85, 3456 (1981).
Effects of Molecular Structure and Basicity. The Gas Phase Proton Affinities of Cyclic Phosphites, R. V. Hodges, F. A. Houle, J. L. Beauchamp, R. A. Montag and J. G. Verkade, J. Am. Chem. Soc. 102, 932 (1980).
On Exit Channel Coupling Effects in the Unimolecular Decomposition of Triatomics, D. L. Bunker, K. R. Wright, W. L. Hase and F. A. Houle, J. Phys. Chem. 83, 933 (1979).
Photoelectron Spectroscopy of Methyl, Ethyl, Isopropyl and tert-Butyl Radicals. Implications for the Thermochemistry and Structures of the Radicals and their Corresponding Carbonium Ions, F. A. Houle and J. L. Beauchamp, J. Am. Chem. Soc. 101, 4067 (1979).
Detection and Investigation of Allyl and Benzyl Radicals by Photoelectron Spectroscopy, F. A. Houle and J. L. Beauchamp, J. Am. Chem. Soc. 100, 3290 (1978).
The First Ionization Potential of Ethyl Radical by Photoelectron Spectroscopy, F. A. Houle and J. L. Beauchamp, Chem. Phys. Lett. 48, 457 (1977).
The Nature of the Bonding of Li+ to H2O and NH3; Ab Initio Studies, R. L. Woodin, F. A. Houle and W. A. Goddard, III, Chem. Phys. 14, 461 (1976).
Issued patents
Selective Deposition of Copper, T. H. Baum, F. A. Houle, C. R. Jones and C. A. Kovac, U.S. Patent No. 4,574,095 (March 4, 1986)
A Rapid Etching Method for Silicon by SF6 Gas, T. J. Chuang, F. A. Houle and K. Petersen, U.S. Patent No. 4,617,086 (October 14, 1986)
Process for Depositing Metallic Copper, T. H. Baum, F. A. Houle and C. R. Jones, Canadian Patent No. 1225363 (August 11, 1987)
Spatially Resolved Stochastic Simulation Systems, W. D. Hinsberg and F. A. Houle, U.S. Patent No. 5,446,870 (August 29, 1995)
Method for Producing Thin Film Magnetic Structure, R. Fontana, F. A. Houle and C. Tsang, U. S. Patent No. 5,503,870 (April 2, 1996)
Method for Producing Thin Film Magnetic Structure, R. Fontana, F. A. Houle and C. Tsang, U. S. Patent No. 5,582,860 (December 10, 1996)
Stochastic Simulation Method for Processes Containing Equilibrium Steps, W. D. Hinsberg and F. A. Houle, U. S. Patent No. 5,625,579 (April 29, 1997)
Method for Stochastic and Deterministic Timebase Control in Stochastic Simulations, W. D. Hinsberg and F. A. Houle, U. S. Patent No. 5,745,385 (April 28, 1998)
Software Architecture for Stochastic Simulation of Non-Homogeneous Systems, W. D. Hinsberg and F. A. Houle, U. S. Patent No. 5,826,065 (October 20, 1998)
Self-Longitudinally Biased Magnetoresistive Read Transducer, R. Fontana, F. A. Houle and C. Tsang, U. S. Patent No. 6,188,550 (February 13, 2001)
Low silicon outgassing resist for bilayer lithography, M. Khojasteh, R. W. Kwong, K-J Chen, P. R. Varanasi, R. D. Allen, P. Brock, F. Houle, R. Sooriyakumaran. U. S. Patent No. 6,770,419 (August 3, 2004)
Apparatus for characterization of photoresist resolution, and method of use, W. Hinsberg, J. Hoffnagle, F. A. Houle, M. Sanchez, U. S. Patent No. 7,046,342 (May 16, 2006).
Fast model-based optical proximity correction, M. Gallatin, R. L. Gordon, W. Hinsberg, J. Hoffnagle, F. A. Houle, A. Lvov, A. E. Rosenbluth, M. Sanchez, N. Seong, U. S. Patent No. 7,079,223 (July 18, 2006).
Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging, D. R. Medeiros, W.-S. Huang, G. M. Wallraff, W. D. Hinsberg, F. A. Houle, U. S. Patent No. 7,090,963 (August 15, 2006).
Apparatus for characterization of photoresist resolution, and method of use, W. D. Hinsberg, J. Hoffnagle, F. A. Houle, M. Sanchez, U. S. Patent No. 7,179,571 (February 20, 2007).
Processes and materials for step and flash imprint lithography, R. DiPietro, M. W. Hart, F. A. Houle, H. Ito, U. S. Patent No. 7,419,611 (September 2, 2008).
Stabilization of vinyl ether materials, F. A. Houle, H. Ito, U. S. Patent 7,488,771 (February 10, 2009).
Phase change materials and associated memory devices, Y. Chen, F. A. Houle, S. Raoux, C. T. Rettner, A. Schrott, U. S. Patent No. 7,501,648 (March 10, 2009)
Release layer for imprinted photocationic curable resins, R. D. Allen, M. W. Hart, F. A. Houle, H. Ito, U. S. Patent No. 7,749,422 (July 6, 2010)
Phase change materials and associated memory devices, Y. Chen, F. A. Houle, S. Raoux, C. T. Rettner, A. Schrott, U. S. Patent No. 7,875,873 (January 25, 2011)
Amorphous nitride release layers for imprint lithography, and method of use, F. A. Houle, C. Jahnes, S. Raoux, S. Rossnagel, U. S. Patent No. 8,029,716 (October 4, 2011)
Amorphous oxide release layers for imprint lithography, and method of use, F. A. Houle, S. Raoux, U. S. Patent No. 8,114,331 (February 14, 2012)
Processes and materials for step and flash imprint lithography, R. DiPietro, M. W. Hart, F. A. Houle, H. Ito, U. S. Patent No. 8,128,832 (March 6, 2012)
Stabilizers for vinyl ether resist formulations for imprint lithography, T. Furukawa, F. A. Houle, S. A. Swanson, U. S. Patent No. 8,168,109 (May 1, 2012)
Vinyl ether resist formulations for imprint lithography and processes of use, T. Furukawa, F. A. Houle, U. S. Patent No. 8,168,691 (May 1, 2012)
Method and apparatus for sub-pellicle defect reduction on photomasks, J. Burnham, F. A. Houle, L. Kindt, S. Patent No. 8,173,331 (May 8, 2012)
Aromatic vinyl ether based reverse-tone step and flash imprint lithography, R. DiPietro, M. W. Hart, F. A. Houle, H. Ito, U. S. Patent No. 8,262,961 (Sept 11, 2012)
Stabilization of Vinyl Ether Materials, F. A. Houle and H. Ito, U. S. Patent No. 8,637,602 (Jan 28, 2014)
Aromatic vinyl ether based reverse-tone step and flash imprint lithography, R. DiPietro, M. W. Hart, F. A. Houle, H. Ito, U. S. Patent No. 8,759,415 (June 24, 2014)